Sami Franssila.
2nd ed.
Chichester, West Sussex, England ; Hoboken, NJ : John Wiley & Sons, 2010.
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2010
1 online resource (xiv, 518 p.) : ill.
Front Matter
Introduction
Micrometrology and Materials Characterization
Simulation of Microfabrication Processes
Silicon
Thin-Film Materials and Processes
Epitaxy
Advanced Thin Films
Pattern Generation
Optical Lithography
Advanced Lithography
Etching
Wafer Cleaning and Surface Preparation
Thermal Oxidation
Diffusion
Ion Implantation
CMP: Chemical-Mechanical Polishing
Bonding
Polymer Microprocessing
Glass Microprocessing
Anisotropic Wet Etching
Deep Reactive Ion Etching
Wafer Engineering
Special Processes and Materials
Serial Microprocessing
Process Integration
MOS Transistor Fabrication
Bipolar Transistors
Multilevel Metallization
Surface Micromachining
MEMS Process Integration
Process Equipment
Equipment for Hot Processes
Vacuum and Plasmas
CVD and Epitaxy Equipment
Cleanrooms
Yield and Reliability
Economics of Microfabrication
Moore's Law and Scaling Trends
Microfabrication at Large
Appendix A: Properties of Silicon
Appendix B: Constants and Conversion Factors
Appendix C: Oxide and Nitride Thickness by Color
Index.
Includes bibliographical references and index.
This accessible text is now fully revised and updated, providing an overview of fabrication technologies and materials needed to realize modern microdevices. It demonstrates how common microfabrication principles can be applied in different applications, to create devices ranging from nanometer probe tips to meter scale solar cells, and a host of microelectronic, mechanical, optical and fluidic devices in between. Latest developments in wafer engineering, patterning, thin films, surface preparation and bonding are covered. This second edition includes:. ・      &
English (eng)
English (eng)
DC22:621.381
LCC:TK7875
Microelectromechanical systems.
Electronic apparatus and appliances.
TECHNOLOGY & ENGINEERING -- Electronics -- Microelectronics.
9781119990413 (electronic bk.)
LCCN : 2010010076
10.1002/9781119990413